4 # Default Value File for MOS Structures
6 puts "Loading default MOS parameters..."
7 puts "These settings can be overwrite by user"
11 #COMMENT Structure Definitions
12 # LGATE = gate length (microns)
13 # LSOURCE = distance from left device edge
14 # to gate edge (microns)
15 # LSCONT = length of source contact (microns)
16 # LDRAIN = distance from right device edge
17 # to gate edge (microns)
18 # LDCONT = length of drain contact (microns)
19 # LSPACER = spacer thickness (microns)
20 # TOX = gate oxide thickness (microns)
23 set LSOURCE
[ expr 1.0]
24 set LSCONT
[ expr 0.5]
25 set LDRAIN
[ expr 1.0]
26 set LDCONT
[ expr 0.5]
27 set LSPACER
[ expr 0.2]
28 set TOX
[ expr 0.0250]
30 #COMMENT Doping Information
31 # TRANTYPE = transistor type (NMOS or PMOS)
32 # PROFTYPE = profile type (ANALYTIC, SUPREM3, TSUPREM4,
34 # LATD = source/drain and LDD lateral diffusion factor
35 # Analytic Profile Parameters
36 # NSUB = substrate doping (#/cm^3)
37 # VTTYPE = doping type for threshold adjust implant (N or P)
38 # VTPEAK = peak doping for threshold adjust implant (#/cm^3)
39 # VTCHAR = characteristic length
40 # for threshold implant (microns)
41 # SDPEAK = peak doping for source/drain (#/cm^3)
42 # SDJUNC = junction depth for source/drain (microns)
43 # LDDPEAK = peak doping for lightly doped drain (#/cm^3)
44 # LDDJUNC = junction depth for lightly doped drain (microns)
53 set VTPEAK
[expr 2E16
]
54 set VTCHAR
[expr 0.25]
55 set SDPEAK
[expr 1E20
]
56 set SDJUNC
[expr 0.25]
57 set LDDPEAK
[expr 2E18
]
58 set LDDJUNC
[expr 0.35]
61 #COMMENT Grid Spacings, Ratio, Maximum Voltage
62 # CHANSP = vertical grid spacing in the channel (microns)
63 # JUNCSP = grid spacing at junctions (microns)
64 # RATIO = grid spacing ratio
65 # VDBMAX = maximum drain-substrate reverse bias (volts)
67 set CHANSP
[expr 0.0125]
68 set JUNCSP
[expr 0.0250]
72 # COMMENT Material of gate
73 # GATE = gate material, default: PolySi
74 if {$TRANTYPE == "PMOS"} {